A new method of layer deposition

S. G. Psakh'e, K. P. Zol'nikov, T. Yu Uvarov

    Research output: Contribution to journalArticle

    Abstract

    A new approach to layer-by-layer film deposition is developed based on the data of molecular dynamics modeling. The proposed deposition method makes use of a nonlinear pulse interaction with a free material (source) surface. It is shown that, provided the pulse amplitude is sufficiently large, an atomic plane is detached from the surface. Impinging on a target (substrate), the detached plane forms a monolayer coating. Combining various source materials, it is possible to obtain multilayer films with complicated compositions and structures.

    Original languageEnglish
    Pages (from-to)851-853
    Number of pages3
    JournalTechnical Physics Letters
    Volume26
    Issue number10
    DOIs
    Publication statusPublished - 1 Jan 2000

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

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  • Cite this

    Psakh'e, S. G., Zol'nikov, K. P., & Uvarov, T. Y. (2000). A new method of layer deposition. Technical Physics Letters, 26(10), 851-853. https://doi.org/10.1134/1.1321217