A high-current ion accelerator for short-pulse ion implantation

A high-current pulsed accelerator, producing ion beams with a current density of 4-20 A/cm², an energy of 30-150 kV/n (n is the ion charge), a beam cross-section area of 180 cm², and a pulse repetition frequency of up to 10 Hz, is described. The accelerator comprises a high-voltage (300 kV) pulse transformer, a nanosecond generator using low-ohmic cables capable of producing two voltage pulses of arbitrary polarity, and a magnetically insulated diode. The first nanosecond voltage pulse forms an explosion-emission plasma at the anode surface, and the following nanosecond pulse accelerates the ions. Performance of the accelerator is illustrated by data on the production of hydrogen, carbon, and aluminum ion beams.