A high-current impulse implanter

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Abstract

A high-current impulse implanter on the basis of a high-current ion diode with a radial magnetic field and preliminary plasma production is described. Plasma is formed at the diode anode using a negative voltage pulse that precedes an accelerating-voltage pulse. The pause between pulses is 500 ± 50 ns. Graphite is used as the emission coating on the anode. An ion beam with a current density in the diode focal plane of up to 80 A/cm2 was obtained. Analysis of the elemental composition of the ion beam using the time-of-flight technique showed that the ion beam consists mainly of С+ and С+2 carbon ions and Н+ protons.

Original languageEnglish
Pages (from-to)708-710
Number of pages3
JournalInstruments and Experimental Techniques
Volume58
Issue number5
DOIs
Publication statusPublished - 1 Sep 2015

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ASJC Scopus subject areas

  • Instrumentation

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