A high-current impulse implanter

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A high-current impulse implanter on the basis of a high-current ion diode with a radial magnetic field and preliminary plasma production is described. Plasma is formed at the diode anode using a negative voltage pulse that precedes an accelerating-voltage pulse. The pause between pulses is 500 ± 50 ns. Graphite is used as the emission coating on the anode. An ion beam with a current density in the diode focal plane of up to 80 A/cm2 was obtained. Analysis of the elemental composition of the ion beam using the time-of-flight technique showed that the ion beam consists mainly of С+ and С+2 carbon ions and Н+ protons.

Original languageEnglish
Pages (from-to)708-710
Number of pages3
JournalInstruments and Experimental Techniques
Volume58
Issue number5
DOIs
Publication statusPublished - 1 Sep 2015

Fingerprint

Ion beams
high current
impulses
Diodes
ion beams
diodes
Anodes
anodes
pulses
Plasma sources
Ions
Electric potential
electric potential
Protons
ions
Graphite
Current density
graphite
Magnetic fields
current density

ASJC Scopus subject areas

  • Instrumentation

Cite this

A high-current impulse implanter. / Stepanov, Andrey Vladimirovich; Shamanin, Vitaly Igorevich; Remnev, G. E.

In: Instruments and Experimental Techniques, Vol. 58, No. 5, 01.09.2015, p. 708-710.

Research output: Contribution to journalArticle

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