300-keV High-power ion-beam source: Practical applications

O. I. Goncharov, I. F. Isakov, V. N. Kolodii, V. M. Matvienko, M. S. Opekunov, G. E. Remnev, Yury Petrovich Usov, A. N. Zakutayev

Research output: Chapter in Book/Report/Conference proceedingConference contribution

12 Citations (Scopus)

Abstract

A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.

Original languageEnglish
Title of host publication1990 8th International Conference on High-Power Particle Beams, BEAMS 1990
Pages1243-1248
Number of pages6
Publication statusPublished - 1990
Event1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 - Novosibirsk, Russian Federation
Duration: 2 Jul 19905 Jul 1990

Other

Other1990 8th International Conference on High-Power Particle Beams, BEAMS 1990
CountryRussian Federation
CityNovosibirsk
Period2.7.905.7.90

ASJC Scopus subject areas

  • Nuclear and High Energy Physics

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    Goncharov, O. I., Isakov, I. F., Kolodii, V. N., Matvienko, V. M., Opekunov, M. S., Remnev, G. E., Usov, YP., & Zakutayev, A. N. (1990). 300-keV High-power ion-beam source: Practical applications. In 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 (pp. 1243-1248). [6396428]