300-keV High-power ion-beam source: Practical applications

O. I. Goncharov, I. F. Isakov, V. N. Kolodii, V. M. Matvienko, M. S. Opekunov, G. E. Remnev, Yury Petrovich Usov, A. N. Zakutayev

Research output: Chapter in Book/Report/Conference proceedingConference contribution

12 Citations (Scopus)

Abstract

A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.

Original languageEnglish
Title of host publication1990 8th International Conference on High-Power Particle Beams, BEAMS 1990
Pages1243-1248
Number of pages6
Publication statusPublished - 1990
Event1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 - Novosibirsk, Russian Federation
Duration: 2 Jul 19905 Jul 1990

Other

Other1990 8th International Conference on High-Power Particle Beams, BEAMS 1990
CountryRussian Federation
CityNovosibirsk
Period2.7.905.7.90

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ASJC Scopus subject areas

  • Nuclear and High Energy Physics

Cite this

Goncharov, O. I., Isakov, I. F., Kolodii, V. N., Matvienko, V. M., Opekunov, M. S., Remnev, G. E., ... Zakutayev, A. N. (1990). 300-keV High-power ion-beam source: Practical applications. In 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 (pp. 1243-1248). [6396428]