Abstract
A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.
| Original language | English |
|---|---|
| Title of host publication | 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 |
| Pages | 1243-1248 |
| Number of pages | 6 |
| Publication status | Published - 1990 |
| Event | 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 - Novosibirsk, Russian Federation Duration: 2 Jul 1990 → 5 Jul 1990 |
Other
| Other | 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 |
|---|---|
| Country | Russian Federation |
| City | Novosibirsk |
| Period | 2.7.90 → 5.7.90 |
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ASJC Scopus subject areas
- Nuclear and High Energy Physics
Cite this
Goncharov, O. I., Isakov, I. F., Kolodii, V. N., Matvienko, V. M., Opekunov, M. S., Remnev, G. E., ... Zakutayev, A. N. (1990). 300-keV High-power ion-beam source: Practical applications. In 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 (pp. 1243-1248). [6396428]