Abstract
A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.
| Original language | English |
|---|---|
| Title of host publication | 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 |
| Pages | 1243-1248 |
| Number of pages | 6 |
| Publication status | Published - 1990 |
| Event | 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 - Novosibirsk, Russian Federation Duration: 2 Jul 1990 → 5 Jul 1990 |
Other
| Other | 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 |
|---|---|
| Country | Russian Federation |
| City | Novosibirsk |
| Period | 2.7.90 → 5.7.90 |
ASJC Scopus subject areas
- Nuclear and High Energy Physics
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Goncharov, O. I., Isakov, I. F., Kolodii, V. N., Matvienko, V. M., Opekunov, M. S., Remnev, G. E., Usov, YP., & Zakutayev, A. N. (1990). 300-keV High-power ion-beam source: Practical applications. In 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 (pp. 1243-1248). [6396428]