300-keV High-power ion-beam source: Practical applications

O. I. Goncharov, I. F. Isakov, V. N. Kolodii, V. M. Matvienko, M. S. Opekunov, G. E. Remnev, Yury Petrovich Usov, A. N. Zakutayev

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

12 Citations (Scopus)

Abstract

A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.

Original language	English
Title of host publication	1990 8th International Conference on High-Power Particle Beams, BEAMS 1990
Pages	1243-1248
Number of pages	6
Publication status	Published - 1990
Event	1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 - Novosibirsk, Russian Federation Duration: 2 Jul 1990 → 5 Jul 1990

Other

Other	1990 8th International Conference on High-Power Particle Beams, BEAMS 1990
Country	Russian Federation
City	Novosibirsk
Period	2.7.90 → 5.7.90

Fingerprint

high voltages

anodes

accelerators

ion beams

pulses

ASJC Scopus subject areas

Nuclear and High Energy Physics

Cite this

Goncharov, O. I., Isakov, I. F., Kolodii, V. N., Matvienko, V. M., Opekunov, M. S., Remnev, G. E., ... Zakutayev, A. N. (1990). 300-keV High-power ion-beam source: Practical applications. In 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990 (pp. 1243-1248). [6396428]

300-keV High-power ion-beam source : Practical applications. / Goncharov, O. I.; Isakov, I. F.; Kolodii, V. N.; Matvienko, V. M.; Opekunov, M. S.; Remnev, G. E.; Usov, Yury Petrovich; Zakutayev, A. N.

1990 8th International Conference on High-Power Particle Beams, BEAMS 1990. 1990. p. 1243-1248 6396428.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Goncharov, OI, Isakov, IF, Kolodii, VN, Matvienko, VM, Opekunov, MS, Remnev, GE , Usov, YP & Zakutayev, AN 1990, 300-keV High-power ion-beam source: Practical applications. in 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990., 6396428, pp. 1243-1248, 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990, Novosibirsk, Russian Federation, 2.7.90.

Goncharov OI, Isakov IF, Kolodii VN, Matvienko VM, Opekunov MS, Remnev GE et al. 300-keV High-power ion-beam source: Practical applications. In 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990. 1990. p. 1243-1248. 6396428

Goncharov, O. I. ; Isakov, I. F. ; Kolodii, V. N. ; Matvienko, V. M. ; Opekunov, M. S. ; Remnev, G. E. ; Usov, Yury Petrovich ; Zakutayev, A. N. / 300-keV High-power ion-beam source : Practical applications. 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990. 1990. pp. 1243-1248

@inproceedings{bf215ca8a89546daa08303525d7d24a2,

title = "300-keV High-power ion-beam source: Practical applications",

abstract = "A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.",

author = "Goncharov, {O. I.} and Isakov, {I. F.} and Kolodii, {V. N.} and Matvienko, {V. M.} and Opekunov, {M. S.} and Remnev, {G. E.} and Yury Petrovich Usov and Zakutayev, {A. N.}",

year = "1990",

language = "English",

isbn = "9789810205454",

pages = "1243--1248",

booktitle = "1990 8th International Conference on High-Power Particle Beams, BEAMS 1990",

}

TY - GEN

T1 - 300-keV High-power ion-beam source

T2 - Practical applications

AU - Goncharov, O. I.

AU - Isakov, I. F.

AU - Kolodii, V. N.

AU - Matvienko, V. M.

AU - Opekunov, M. S.

AU - Remnev, G. E.

AU - Usov, Yury Petrovich

AU - Zakutayev, A. N.

PY - 1990

Y1 - 1990

N2 - A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.

AB - A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.

UR - http://www.scopus.com/inward/record.url?scp=84874040530&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84874040530&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84874040530

SN - 9789810205454

SP - 1243

EP - 1248

BT - 1990 8th International Conference on High-Power Particle Beams, BEAMS 1990